Profile: Carl Zeiss Ltd. offers solutions to industrial, medical and research sectors. We determine to develop and distribute surgical microscopes, diagnostic systems for ophthalmology, microscopes, lithography optics, industrial measuring technology, eyeglass lenses, planetarium technology, optronic products, camera and cine lenses. Our automatic pellicle removal is a novel tool to remove pellicles automatically from photomasks. It comes under our semiconductor metrology system category. It enables to overcome contamination risk through manual handling, scratches by manual removal process and uncontrolled process parameters. Wafer-level CD metrology, our another solution comes under our mask metrology subject. It measures critical dimensions at wafer level and at scanner wavelength with high throughput.