Profile: General Air Corp. is a manufacturer of process equipment. Our product line includes environmental chamber, environmental air handler, exhausted laminar flow station, liquid phase epitaxial (LPE) reactor, stainless steel gas panels & lines, and furnace systems. Our PRD-1000 Mini-Environment is specifically designed for photo-resist applications in the semiconductor industry. The PRD-1000 mini-environment is commonly used to house photo-resist deposition machines, where temperature and humidity must be closely controlled. The chamber uses the desiccant dehumidification method, providing Class 10 or better cleanliness, while allowing temperature and humidity to be set individually within a specified range. The system is very compact, and can be designed to fit into different facilities, while being able to house a variety of instruments. Our exhausted laminar flow station is a combination of fume hood and laminar station. It combines a regular Class 100 laminar flow hood with an exhausted polypropylene wet work top. The work top is constructed of .5" white stress-relieved polypropylene. It includes perforated strips at the front and rear, with an exhausted planum designed to contain all fluid leaks and splashes. It is also designed to be a suction planum to exhaust fumes outside the facility. The entire work area is covered by a Class 100 laminar flow hood maintaining a contamination-free environment.
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• | Electronics Components | • | Semiconductor Process Equipment | • | Semiconductors |