Profile: Oxford Applied Research Ltd. supplies UHV & HV components and systems for the deposition & characterisation of thin films. Our mini e-beam evaporators are employed to deposit ultra-pure films of materials. The deposition rate is highly controllable, allowing the instruments to be employed in surface science or thin-film applications. It is also possible to co-evaporate up to four materials with independent regulation of the deposition rate from a single power supply. Ion milling system features a small-footprint, front-door loading system that comprises an RF50/150 ion source with autotune ,plus a versatile water-cooled specimen holder with provision for tilt, rotation and bias. The chamber achieves low 10-8 mbar without bake-out.