Profile: SemEquip, Inc. is the developer of cluster ion implantation sub-systems and advanced ion source materials for the manufacture of logic & memory chips. We utilize the cluster beam ion implantation for manufacturing integrated circuits at the lowest cost and highest throughput. Our products include Clusterion® source, Clusterboron® and clustercarbon™. The Clusterion® source produces a very small beam emittance, as much as an order of magnitude smaller than conventional ion sources. This allows substantial low energy beam currents to be delivered even in serial, medium current implanter tools which require a small beam divergence. This feature enables the use of the medium current tool to perform high dose, low energy implants at high tilt angles, a requirement that is rapidly becoming the industries preferred process for sub-90nm devices. Our Clusterboron® is a solid form of B18H22, which when delivered by our patented vapor delivery system, enables high dose, high throughput implants at energies as low as 200 eV. Since B18H22 + delivers eighteen boron atoms per ion to the wafer, the ion beam is transported to the wafer at 20 times the desired implant energy and at 1/18th the desired dose rate thus, a 20 keV, 1 mA B18H22 + implant is process-equivalent to 18 mA of B+ at 1 keV.